Papers - ICHIMURA Masaya

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  • n-type and p-type semiconducting Cu-doped Mg (OH)2 thin films Reviewed International journal

    M. Keikhaei, M. Ichimura

    Semicond. Sci. Technol.   35 ( 3 )   035020   2020.03

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Fabrication of p-type Transparent (CuZn)O Thin Films by the Electrochemical Deposition Method Reviewed International journal

    M. Keikhaei and M. Ichimura

    Int. J. Electrochem. Sci.   2020.01

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Fabrication of ZnO/NiO transparent solar cells by electrochemical deposition Reviewed

    M. Koyama, M. Ichimura

    Jpn. J. Appl. Phys.   58   128003   2019.12

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Fabrication of Mg(OH)2 Thin Films by Electrochemical Deposition with Cu Catalyst Reviewed

    M. Keikhaei, M. Ichimura

    Thin Solid Films   681   41 - 46   2019.07

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Fabrication of photovoltaic FeSxOy/ZnO heterostructures by electrochemical deposition

    W. Ji, M. Ichimura

    Jpn. J. Appl. Phys.   58   050922   2019.05

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Semiconducting Cu-doped AlOx films fabricated by drop-photochemical deposition Reviewed International journal

    M. Umemura, M. Ichimura

    Mater. Res. Express   6   035904   2019.03

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/2053-1591/aaf47b

  • On the Possibility of Valence Control of Aluminum Oxide for Electronics Applications Reviewed International journal

    M. Ichimura

    J. Electron. Mater.   6 ( 1 )   583 - 588   2019.01

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1007/s11664-018-6749-9

  • Fabrication of Pyrite FeS2 Films from Electrochemically Deposited FeOOH by Sulfur Annealing Reviewed International journal

    S. Maki, N. Takeda, M. Ichimura

    Int. J. Electrochem. Sci.   13   10829 - 10836   2018.10

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Fabrication of Copper Oxide Thin Films by Galvanostatic Deposition from Weakly Acidic Solutions Reviewed International journal

    M. Keikhaei, M. Ichimura

    Int. J. Electrochem. Sci.   13   9931 - 9941   2018.09

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Electrochemical deposition of Cu-doped p-type iron oxide thin films Reviewed International journal

    S. Kobayashi, M. Ichimura

    Semicond. Sci. Technol.   33 ( 9 )   105006   2018.09

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6641/aad76a

  • Passivation of surface recombination at the Si-face of 4H-SiC by acidic solutions Reviewed International journal

    Y. Ichikawa, M. Ichimura, T. Kimoto, M. Kato

    ECS J. Solid St. Sci. Technol.   7 ( 8 )   Q127 - Q130   2018.08

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Fast electrochemical deposition of Ni(OH)2 precursor involving water electrolysis for fabrication of NiO thin films Reviewed International journal

    M. Koyama, M. Ichimura

    Semicond. Sci. Technol.   33 ( 5 )   055011   2018.05

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/1361-6641/aab98f

  • Effects of Complexing Agents on Electrochemical Deposition of FeSxOy in ZnO/FeSxOy Heterostructures Reviewed International journal

    A. Supee, M. Ichimura

    Applied Physics A   123   722   2017.11

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1007/s00339-017-1340-4

  • Improved performance of 3C-SiC photocathodes by using a pn junction Reviewed International journal

    N. Ichikawa, M. Ichimura, M. Kato

    Int. J. Hydrogen Energy   42   22698 - 22703   2017.10

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Electrochemical deposition of transparent p-type semiconductor NiO Reviewed

    137   542 - 546   2017.09

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    Language:Japanese   Publishing type:Research paper (scientific journal)  

  • Drop-photochemical deposition of aluminum oxide thin films from aqueous solutions Reviewed International journal

    S. Sato and M. Ichimura

    Materials Research Express   4   046405   2017.04

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.1088/2053-1591/aa6c0f

  • Three-step pulse electrochemical deposition of FeSxOy thin films and their characterization Reviewed International journal

    A. Supee and M. Ichimura

    Materials Research Express   4   036410   2017.03

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    Language:English   Publishing type:Research paper (scientific journal)  

  • The enhanced performance of 3C-SiC photocathodes for the generation of hydrogen Reviewed International journal

    N. Ichikawa, M. Kato, M. Ichimura

    Appl. Phys. Lett.   109   153904   2016.10

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Effects of annealing on properties of electrochemically deposited CuxZnyS thin films Reviewed

    Bayingaerdi Tong and M. Ichimura

    Trans. Mater. Res. Soc. Jpn.   41   255   2016.09

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    Language:English   Publishing type:Research paper (scientific journal)  

  • Annealing of p-type wide-gap CuxZnyS thin films deposited by the photochemical deposition method Reviewed

    Bayingaerdi Tong and M. Ichimura

    Jpn. J. Appl. Phys.   55   098004   2016.09

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    Language:English   Publishing type:Research paper (scientific journal)  

    DOI: 10.7567/JJAP.55.098004

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