Papers - SOGA Tetsuo
-
Initial stage of heteroepitaxial growth of compound semiconductor on Si substrate Reviewed
Mat. Res Soc. Symp. Proc. 221 ( 12A ) 155 - 160 1991.04
Publishing type:Research paper (international conference proceedings)
-
Nucleation mechanisms for compound semiconductors grown on Si by MOCVD Reviewed
J. Crystal Growth 115 ( 12A ) 418 - 422 1991.04
Publishing type:Research paper (scientific journal)
-
Growth mechanism of GaP on Si substrate by MOVPE Reviewed
J. Crystal Growth 115 ( 12A ) 158 - 163 1991.04
Publishing type:Research paper (scientific journal)
-
Effect of InGaAs/InP strained layer superlattice in InP-on-Si Reviewed
J. Crystal Growth 115 ( 12A ) 154 - 157 1991.04
Publishing type:Research paper (scientific journal)
-
Initial growth mechanism for GaAs and GaP on Si substrate by metalorganic chemical vapor deposition Reviewed
Jpn. J. Appl. Phys. 30 ( 12A ) 3471 - 3474 1991.04
Publishing type:Research paper (scientific journal)
-
MOCVD Growth and Evaluation of GaAs on p+n-Si and n+p-Si Substrates
M. Umeno, F. Cai, T. Jimbo, T. Soga, D. Imanishi, H. Matsuo
名古屋工業大学学報 42 137 - 141 1991.03
Language:English Publishing type:Research paper (bulletin of university, research institution)
-
Improvement of GaAs metal-semiconductor field-effect transistors characteristics on SiO2 back-coated Si substrate by metalorganic chemical vapor deposition Reviewed
Jpn. J. Appl. Phys. 29 ( 12 ) L2417 - L2419 1990.04
Publishing type:Research paper (scientific journal)
-
High quality GaAs-on-Si by MOCVD with ternary alloys, AlGaP and AlGaAs Reviewed
Inst. Phys. Conf. Ser. 29 ( 106 ) 117 - 122 1990.04
Publishing type:Research paper (international conference proceedings)
-
Effects of growth temperature and V/III ratio on MOCVD-grown GaAs-on-Si Reviewed
Jpn. J. Appl. Phys 29 ( 1 ) 138 - 144 1990.04
Publishing type:Research paper (scientific journal)
-
Low etch pit density GaAs on Si grown by metalorganic chemical vapor deposition Reviewed
Appl. Phys. Lett. 56 ( 15 ) 1433 - 1435 1990.04
Publishing type:Research paper (scientific journal)
-
J. Appl. Phys. 67 ( 11 ) 6908 - 6913 1990.04
Publishing type:Research paper (scientific journal)
-
Room-temperature cw operation of AlGaAs/GaAs SQW lasers on Si substrate by MOCVD using AlGaAs/AlGaP intermediate layer Reviewed
Jpn. J. Appl. Phys 29 ( 7 ) L1133 - L1135 1990.04
Publishing type:Research paper (scientific journal)
-
Appl. Phys. Lett. 57 ( 12 ) 1179 - 1181 1990.04
Publishing type:Research paper (scientific journal)
-
Etch pit study of MOCVD-grown GaAs on Si with III-V compound intermediate layers Reviewed
Defect Control in Semiconductors 198 ( 12 ) 1307 - 1311 1990.04
Publishing type:Research paper (international conference proceedings)
-
Defect reduction of GaAs on Si by alloy strained superlattice layer Reviewed
Defect Control in Semiconductors 198 ( 12 ) 1287 - 1294 1990.04
Publishing type:Research paper (international conference proceedings)
-
Nature and behavior of anti-phase-domains in GaAs/Si heterostructures grown by metalorganic chemical vapor deposition Reviewed
Defect Control in Semiconductors 198 ( 12 ) 1141 - 1146 1990.04
Publishing type:Research paper (international conference proceedings)
-
TEM characterization of dislocations in GaAs-on-Si heterostructures with superlattice intermediate layer Reviewed
Mat. Res Soc. Symp. Proc. 198 ( 12 ) 201 - 206 1990.04
Publishing type:Research paper (international conference proceedings)
-
Characteristics of MOCVD-grown AlGaAs/GaAs SQW lasers and GaAs MESFETs fabrication on Si substrate with SiO2-back coating Reviewed
Mat. Res Soc. Symp. Proc. 198 ( 12 ) 141 - 146 1990.04
Publishing type:Research paper (international conference proceedings)
-
Characterization of MOCVD-grown GaAs/strained layer superlattices/GaP/Si heterostructures by transmission electron microscopy Reviewed
J. Crystal Growth 106 ( 12 ) 491 - 497 1990.04
Publishing type:Research paper (scientific journal)
-
Etch pit observation of InP Reviewed
Jpn. J. Appl. Phys. 28 ( 5 ) 941 - 942 1989.04
Publishing type:Research paper (scientific journal)