Presentations -
-
マルチ短パルスHiPIMSにより作成したDLC薄膜の特性
尾関 健太，木村 高志
第24回日本表面真空学会中部支部学術講演会(若手講演会) 2024.12 日本表面真空学会中部支部
Event date： 2024.12
Language：Japanese Presentation type：Oral presentation (general)
Venue：名古屋大学 Country：Japan
-
Fabrication of metal oxide thin film via HiPIMS combined with multi-pulse magnetron sputtering International conference
Shunsuke Ando and Takashi Kimura
The 17th International Symposium on Sputtering and Plasma Processes 2024.07 The Japan Society of Vacuum and Surface Science
Event date： 2024.07
Language：English Presentation type：Poster presentation
Venue：Kyoto Research Park Country：Japan
-
Comparison of properties of diamond-like carbon films prepared via multi-pulse HiPIMS and single-pulse HiPIMS International conference
Kenta Ozeki and Takashi Kimura
The 17th International Symposium on Sputtering and Plasma Processes 2024.07 The Japan Society of Vacuum and Surface Science
Event date： 2024.07
Language：English Presentation type：Poster presentation
Venue：Kyoto Research Park Country：Japan
-
Property of Diamond-like Carbon Film Synthesized via Multi Pulse High-Power Impulse Magnetron Sputtering
Kenta Ozeki and Takashi Kimura
The 41st Symposium on Plasma Processing 2024.01 The Japan Society of Applied Physics
Event date： 2024.01
Language：English Presentation type：Poster presentation
Venue：Tokyo Institute of Technology Country：Japan
-
Fabrication of Metal Oxide Thin Film via HiPIMS Combined with Multi Pulse Magnetron Sputtering
Shunsuke Ando and Takashi Kimura
The 41st Symposium on Plasma Processing 2024.01 The Japan Society of Applied Physics
Event date： 2024.01
Language：English Presentation type：Poster presentation
Venue：Tokyo Institute of Technology Country：Japan
-
Vanadium oxide films synthesized via reactive HiPIMS combined with multi pulse magnetron sputtering International conference
Takashi Kimura and Yoshinobu Takagi
44th International Symposium on Dry Process 2023.11 The JapanSociety of Applied Physics
Event date： 2023.11
Language：English Presentation type：Poster presentation
Venue：Winc Aichi Country：Japan
-
Hard diamond-like carbon thin film deposited by multi pulse HiPIMS
Kenta Ozeki and Takashi Kimura
2023.10
Event date： 2023.10 - 2023.11
Language：Japanese Presentation type：Oral presentation (general)
Country：Japan
-
Fabrication of zirconium oxide films by reactive HiPIMS combined with multi pulse magnetron sputtering
Shunsuke Ando and Takashi Kimura
2023.10
Event date： 2023.10 - 2023.11
Language：Japanese Presentation type：Oral presentation (general)
Country：Japan
-
Synthesis of diamond-like carbon thin film via multi pulse high-power impulse magnetron sputtering International conference
Takashi Kimura
75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas 2022.10 American Physical Society/The Japan Society of Applied Physics
Event date： 2022.10
Language：English Presentation type：Poster presentation
Venue：Sendai International Center Country：Japan
Other Link： https://meetings.aps.org/Meeting/GEC22/Session/HT4.71
-
Properties of vanadium oxide film prepared using pulsed magnetron sputtering
Yoshinobu Takagi, Takashi Kimura
75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas 2022.10 American Physical Society/The Japan Society of Applied Physics
Event date： 2022.10
Language：English Presentation type：Poster presentation
Venue：Sendai International Center Country：Japan
Other Link： https://meetings.aps.org/Meeting/GEC22/Session/HW6.71
-
Si content dependence of TiSiN films prepared by reactive high power pulsed sputtering Penning discharges International conference
Takashi Kimura, Ryo Yoshida, Kingo Azuma
The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11) International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee
Event date： 2019.12
Language：English Presentation type：Poster presentation
Venue：The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan
-
Properties of Titanium–Vanadium Nitride Films Prepared By Reactive High Power Pulsed Sputtering Penning Discharges International conference
Takashi Kimura, Ryo Yoshida, Kingo Azuma
The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11) International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee
Event date： 2019.12
Language：English Presentation type：Poster presentation
Venue：The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan
-
Double Pulsing Method for Preparation of Hard DLC Films in High Power Pulsed Magnetron Sputtering System International conference
Takashi Kimura and Kento Sakai
12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) Asian Joint Committee for Applied Plasma Science and Engineering
Event date： 2019.09
Language：English Presentation type：Poster presentation
Venue：Maison Glad Hotel, Jeju Island, Korea
-
Properties of TiSiN films Prepared by High Power Pulsed Sputtering Penning Discharge International conference
Takashi Kimura, Ryo Yoshida and Kingo Azuma
12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) Asian Joint Committee for Applied Plasma Science and Engineering
Event date： 2019.09
Language：English Presentation type：Poster presentation
Venue：Maison Glad Hotel, Jeju Island, Korea
-
Influence of small amount of hydrocarbon gas mixture on properties of DLC films in high power impulse magnetron sputtering system International conference
Takashi Kimura, Kento Sakai
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10) 第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会
Event date： 2019.07
Language：English Presentation type：Poster presentation
Venue：Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan
-
Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering International conference
Takashi Kimura, Takahiro Tanaka
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10) 第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会
Event date： 2019.07
Language：English Presentation type：Poster presentation
Venue：Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan
-
Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system International conference
Takashi Kimura, Yuki Shibata,Setsuo Nakao and Kingo Azuma
ISSP2019: The 15th International Symposium on Sputtering and Plasma Processes The Japan Society of Vacuum and Surface Science
Event date： 2019.06
Language：English Presentation type：Poster presentation
Venue：金沢工業大学
-
Preparation of TiN films by reactive high power pulsed sputter Penning-type discharges International conference
T. Mishima, T. Kimura, R. Yoshida, K. Azuma, S. Nakao
39th Internatioal Symposium on Dry Process The Japan Society of Applied Physics
Event date： 2017.11
Language：English Presentation type：Oral presentation (general)
Venue：Tokyo Institute of Technology
-
Plasma Based Nitrogen Ion Implantation to Hydrogenated Diamond-like Carbon Films International conference
T. Kimura, H.Yanai, S. Nakao, and K. Azuma
11th Asian-European International Conference on Plasma Surface Engineering Asian Joint Committee for Applied Plasma Science and Engineering
Event date： 2017.09
Language：English Presentation type：Poster presentation
Venue：Jeju, Republic of Korea
-
対向タ－ゲット型反応性HPPSによるTiCN膜の作製
三島俊彦、吉田涼、中尾 節男、東 欣吾、木村 高志
第78回応用物理学会秋季学術講演会 応用物理学会
Event date： 2017.09
Language：Japanese Presentation type：Oral presentation (general)
Venue：福岡国際会議場
PREV - 