Presentations -

マルチ短パルスHiPIMSにより作成したDLC薄膜の特性

尾関 健太，木村 高志

第24回日本表面真空学会中部支部学術講演会(若手講演会)  2024.12  日本表面真空学会中部支部

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Event date： 2024.12

Language：Japanese   Presentation type：Oral presentation (general)  

Venue：名古屋大学   Country：Japan  

Fabrication of metal oxide thin film via HiPIMS combined with multi-pulse magnetron sputtering International conference

Shunsuke Ando and Takashi Kimura

The 17th International Symposium on Sputtering and Plasma Processes  2024.07  The Japan Society of Vacuum and Surface Science

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Event date： 2024.07

Language：English   Presentation type：Poster presentation  

Venue：Kyoto Research Park   Country：Japan  

Comparison of properties of diamond-like carbon films prepared via multi-pulse HiPIMS and single-pulse HiPIMS International conference

Kenta Ozeki and Takashi Kimura

The 17th International Symposium on Sputtering and Plasma Processes  2024.07  The Japan Society of Vacuum and Surface Science

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Event date： 2024.07

Language：English   Presentation type：Poster presentation  

Venue：Kyoto Research Park   Country：Japan  

Property of Diamond-like Carbon Film Synthesized via Multi Pulse High-Power Impulse Magnetron Sputtering

Kenta Ozeki and Takashi Kimura

The 41st Symposium on Plasma Processing  2024.01  The Japan Society of Applied Physics

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Event date： 2024.01

Language：English   Presentation type：Poster presentation  

Venue：Tokyo Institute of Technology   Country：Japan  

Fabrication of Metal Oxide Thin Film via HiPIMS Combined with Multi Pulse Magnetron Sputtering

Shunsuke Ando and Takashi Kimura

The 41st Symposium on Plasma Processing  2024.01  The Japan Society of Applied Physics

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Event date： 2024.01

Language：English   Presentation type：Poster presentation  

Venue：Tokyo Institute of Technology   Country：Japan  

Vanadium oxide films synthesized via reactive HiPIMS combined with multi pulse magnetron sputtering International conference

Takashi Kimura and Yoshinobu Takagi

44th International Symposium on Dry Process   2023.11  The JapanSociety of Applied Physics

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Event date： 2023.11

Language：English   Presentation type：Poster presentation  

Venue：Winc Aichi   Country：Japan  

Hard diamond-like carbon thin film deposited by multi pulse HiPIMS

Kenta Ozeki and Takashi Kimura

2023.10 

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Event date： 2023.10 - 2023.11

Language：Japanese   Presentation type：Oral presentation (general)  

Country：Japan  

Fabrication of zirconium oxide films by reactive HiPIMS combined with multi pulse magnetron sputtering

Shunsuke Ando and Takashi Kimura

2023.10 

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Event date： 2023.10 - 2023.11

Language：Japanese   Presentation type：Oral presentation (general)  

Country：Japan  

Synthesis of diamond-like carbon thin film via multi pulse high-power impulse magnetron sputtering International conference

Takashi Kimura

75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas  2022.10  American Physical Society/The Japan Society of Applied Physics

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Event date： 2022.10

Language：English   Presentation type：Poster presentation  

Venue：Sendai International Center   Country：Japan  

Other Link： https://meetings.aps.org/Meeting/GEC22/Session/HT4.71

Properties of vanadium oxide film prepared using pulsed magnetron sputtering

Yoshinobu Takagi, Takashi Kimura

75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas  2022.10  American Physical Society/The Japan Society of Applied Physics

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Event date： 2022.10

Language：English   Presentation type：Poster presentation  

Venue：Sendai International Center   Country：Japan  

Other Link： https://meetings.aps.org/Meeting/GEC22/Session/HW6.71

Si content dependence of TiSiN films prepared by reactive high power pulsed sputtering Penning discharges International conference

Takashi Kimura, Ryo Yoshida, Kingo Azuma

The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)  International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee

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Event date： 2019.12

Language：English   Presentation type：Poster presentation  

Venue：The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan  

Properties of Titanium–Vanadium Nitride Films Prepared By Reactive High Power Pulsed Sputtering Penning Discharges International conference

Takashi Kimura, Ryo Yoshida, Kingo Azuma

The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)   International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee

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Event date： 2019.12

Language：English   Presentation type：Poster presentation  

Venue：The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan  

Double Pulsing Method for Preparation of Hard DLC Films in High Power Pulsed Magnetron Sputtering System International conference

Takashi Kimura and Kento Sakai

12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  Asian Joint Committee for Applied Plasma Science and Engineering

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Event date： 2019.09

Language：English   Presentation type：Poster presentation  

Venue：Maison Glad Hotel, Jeju Island, Korea  

Properties of TiSiN films Prepared by High Power Pulsed Sputtering Penning Discharge International conference

Takashi Kimura, Ryo Yoshida and Kingo Azuma

12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  Asian Joint Committee for Applied Plasma Science and Engineering

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Event date： 2019.09

Language：English   Presentation type：Poster presentation  

Venue：Maison Glad Hotel, Jeju Island, Korea  

Influence of small amount of hydrocarbon gas mixture on properties of DLC films in high power impulse magnetron sputtering system International conference

Takashi Kimura, Kento Sakai

XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10)  第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会

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Event date： 2019.07

Language：English   Presentation type：Poster presentation  

Venue：Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan  

Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering International conference

Takashi Kimura, Takahiro Tanaka

XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10)  第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会

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Event date： 2019.07

Language：English   Presentation type：Poster presentation  

Venue：Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan  

Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system International conference

Takashi Kimura, Yuki Shibata,Setsuo Nakao and Kingo Azuma

ISSP2019: The 15th International Symposium on Sputtering and Plasma Processes  The Japan Society of Vacuum and Surface Science

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Event date： 2019.06

Language：English   Presentation type：Poster presentation  

Venue：金沢工業大学  

Preparation of TiN films by reactive high power pulsed sputter Penning-type discharges International conference

T. Mishima, T. Kimura, R. Yoshida, K. Azuma, S. Nakao

39th Internatioal Symposium on Dry Process  The Japan Society of Applied Physics

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Event date： 2017.11

Language：English   Presentation type：Oral presentation (general)  

Venue：Tokyo Institute of Technology  

Plasma Based Nitrogen Ion Implantation to Hydrogenated Diamond-like Carbon Films International conference

T. Kimura, H.Yanai, S. Nakao, and K. Azuma

11th Asian-European International Conference on Plasma Surface Engineering  Asian Joint Committee for Applied Plasma Science and Engineering

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Event date： 2017.09

Language：English   Presentation type：Poster presentation  

Venue：Jeju, Republic of Korea  

対向タ－ゲット型反応性HPPSによるTiCN膜の作製

三島俊彦、吉田涼、中尾 節男、東 欣吾、木村 高志

第78回応用物理学会秋季学術講演会  応用物理学会

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Event date： 2017.09

Language：Japanese   Presentation type：Oral presentation (general)  

Venue：福岡国際会議場  

Electrical characteristics of high power pulsed magnetron sputtering system

Takashi Kimura, Toshihiko Mishima

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Event date： 2017.01

Language：English   Presentation type：Poster presentation  

Surface Modification of DLC Films by Plasma Based Nitrogen Ion Implantation Method

H. Yanai, T. Kimura, S. Nakao and K. Azuma

Material research society of Japan

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Event date： 2016.12

Language：English   Presentation type：Poster presentation  

Preparation of Conductive DLC Films by High Power Pulsed Magnetron Sputtering Combined with Plasma Based Ion Implantation System

T. Kimura, H. Kamata, S. Nakao and K. Azuma

Material research society of Japan

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Event date： 2016.12

Language：English   Presentation type：Poster presentation  

The deposition of Titanium Nitride thin film using a high-power pulse Penning sputtering under the Argon/Nitrogen mixture gas atmosphere International conference

Y. Kusuhashi, K. Azuma, T. Kimura

Joint Symposium of 9th Asia-Pacific SYmposium on the Basics and Applications of Plasma Technology and 28th Symposium on Plasma Science for Materials 

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Event date： 2015.12

Language：English   Presentation type：Poster presentation  

Formation of hydrogenated amorphous carbon films by reactive high power impulse magnetron sputtering containing C2H2 gas International conference

Takashi Kimura, Hikaru Kamata

9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing/68th Gaseous Electronics Conference 

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Event date： 2015.10

Language：English   Presentation type：Oral presentation (general)  

Preparation of hydrogenated diamond-like carbon films by reactive Ar/CH4 high power impulse magnetron sputtering with negative pulse voltage International conference

Takashi Kimura, Hikaru Kamata

9th International Conference on Reactive Plasmas/33rd Symposium on Plasma Processing/68th Gaseous Electronics Conference 

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Event date： 2015.10

Language：English   Presentation type：Poster presentation  

Conductive DLC films prepared by high power pulsed magnetron sputtering with bipolar pulse voltage source for substrate International conference

Takashi Kimura, Taku Suyama, Kingo Azuma, Setsuo Nakao, Tsutomu Sonoda, Takeshi Kusumori, Kimihiro Ozaki

The10th Asian-European International Conference on Plasma Surface Engineering  

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Event date： 2015.09

Language：English   Presentation type：Poster presentation  

Properties of high power pulsed sputtering with facing targets

Toshihiko MISHIMA, Takashi KIMURA, Kingo AZUMA, Setsuo NAKAO

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Event date： 2015.09

Language：Japanese   Presentation type：Oral presentation (general)  

Preparation of Ti-DLC and Si-DLC films by reactive HiPIMS

H. Kamata, T. Kimura, S. Nakao, T. Sonoda, T. Kusumori, K. Ozaki, K. Azuma

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Event date： 2015.09

Language：Japanese   Presentation type：Oral presentation (general)  

Preparation of DLC films by high power pulsed magnetron sputtering with facing targets International conference

TOSHIHIKO MISHIMA, TAKASHI KIMURA, KINGO AZUMA AND SETSUO NAKAO

International Symposium on Advanced Plasma Science and its Applications 

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Event date： 2015.03

Language：English   Presentation type：Poster presentation  

Deposition of amorphous carbon films by inductively coupled discharges containing hydrocarbon gases International conference

木村高志、西村亮太郎、杉野幸也

International Symposium on Advanced Plasma Science and its Applications  

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Event date： 2013.01 - 2013.02

Language：English   Presentation type：Oral presentation (general)  

Venue：Nagoya University  

Global Model of inductively coupled CH₄/H₂ Plasmas

Takashi　Kimura

plasma conference2011  日本応用物理学会、プラズマ核融合学会

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Event date： 2011.11

Language：English   Presentation type：Poster presentation  

Venue：金沢  

Properties of high power pulsed magnetron sputtering plasma for deposition of diamond-like carbon (DLC) films

Takashi Kimura, Ryoutaro Nishimura, Masayasu Iida

Plasma Conference2011  日本応用物理学会，プラズマ核融合学会

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Event date： 2011.11

Language：English   Presentation type：Poster presentation  

Venue：金沢  

Properties of inductively coupled rf Ne/N₂ plasmas

Takashi Kimura, Ryoutaro Nishimura

Plasma Conference 2011  日本応用物理学会，プラズマ核融合学会

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Event date： 2011.11

Language：English   Presentation type：Poster presentation  

Venue：金沢  

Deposition of diamond-like carbon films by ｈigh power pulsed magnetron sputtering International conference

Takashi　Kimura, Masayasu Iida

International sysmposium on dry process  日本応用物理学会

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Event date： 2011.11

Language：English   Presentation type：Poster presentation  

Venue：京都ガーデンパレスホテル，日本  

パルスマグネトロンスパッタリングによるダイヤモンドライクカ－ボン成膜

木村高志、飯田将康

電気学会プラズマ研究会  電気学会

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Event date： 2011.05

Language：Japanese   Presentation type：Oral presentation (general)  

Venue：富山大学  

Aｒで希釈された誘導性結合反応性プラズマの特性

木村高志

電気学会研究会  電気学会

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Event date： 2011.03

Language：Japanese   Presentation type：Oral presentation (general)  

Venue：東京工業大学  

Properties of high pressure RF He/CH₄ discharges International conference

Shotaro Kanzaki, Akinori Oda, Takashi Kimura

International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials  

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Event date： 2011.03

Language：English   Presentation type：Poster presentation  

Venue：名古屋工業大学  

誘導性結合高周波CH₄/H₂プラズマの実験とグロ-バルモデル

木村高志，春日井宏樹

電気学会プラズマ研究会  電気学会

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Event date： 2010.12

Language：Japanese   Presentation type：Oral presentation (general)  

Venue：東京工業大学  

Properties of inductively coupled rf CH₄/H₂ discharges International conference

Takashi Kimura, Hiroki Kasugai

気体電子工学国際会議＆反応性プラズマ国際会議 

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Event date： 2010.10

Language：English   Presentation type：Poster presentation  

Venue：Paris  

Deposition of fluorinated diamond-like carbon films using pulsed plasma thruster International conference

Takashi Kimura, Masayasu Iida

気体電子工学国際会議＆反応性プラズマ国際会議 

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Event date： 2010.10

Language：English   Presentation type：Poster presentation  

Venue：Paris  

電熱加速型パルスプラズマ曝露によるフッ化炭素膜の堆積

飯田将康，木村高志

プラズマ研究会  電気学会プラズマ研究会

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Event date： 2010.08

Language：Japanese   Presentation type：Oral presentation (general)  

Venue：岐阜県民文化ホール未来会館