KIMURA Takashi

写真a

Affiliation Department

Department of Physical Science and Engineering
Department of Physical Science and Engineering

Title

Associate Professor

External Link

Degree

  • Doctor (Engineering) ( Nagoya Institute of Technology )

  • Master of Engineering ( Nagoya Institute of Technology )

Research Areas

  • Energy Engineering / Fundamental plasma

From School

  • Nagoya Institute of Technology   Faculty of Engineering   Graduated

    - 1987.03

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    Country:Japan

From Graduate School

  • Nagoya Institute of Technology   Graduate School, Division of Engineering   Master's Course   Completed

    - 1989.03

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    Country:Japan

External Career

  • 三菱重工株式会社   -

    1989.04 - 1990.04

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    Country:Japan

Professional Memberships

  • The Instituteof Electrical Engineers of Japan

  • The Japan Society of Applied Physics

  • The Japan Society of Vacuum and Surface Science

 

Research Career

  • Study on application of atmospheric pressure discharges

    (not selected)  

    Project Year:

  • Design of low pressure plasmas for materials processing

    (not selected)  

    Project Year:

Papers

  • Properties of CrN/TiN multilayer films with nanoscale layer thickness Reviewed International journal

    Takashi Kimura, Hiroki Maeda

    IEEE TRANSACTIONS ON PLASMA SCIENCE   51 ( 2 )   327 - 332   2023.02

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IEEE  

    DOI: 10.1109/TPS.2022.3185148

  • Properties of multilayered CrN/VN films prepared using a hybrid system of high-power impulse magnetron sputtering and pulsed magnetron sputtering Reviewed International journal

    Takashi Kimura, Hiroki Maeda

    IEEE TRANSACTIONS ON PLASMA SCIENCE   51 ( 2 )   320 - 326   2023.02

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    Authorship:Lead author, Corresponding author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IEEE  

    DOI: 10.1109/TPS.2022.3175190

  • Titanium silicon nitride films with low silicon content deposited via reactive high-power pulsed sputtering Penning discharge Reviewed International journal

    T. Kimura, R. Yoshida, K. Azuma

    IEEE TRANSACTIONS ON PLASMA SCIENCE   49 ( 1 )   53 - 60   2021.01

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:IEEE  

    DOI: 10.1109/TPS.2020.3012159

  • Synthesis of hard diamond-like carbon films by double-pulse high-power impulse magnetron sputtering Reviewed International journal

    T. Kimura, K. Sakai

    Diamond & Related Materials   108   107996   2020.08

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier  

    DOI: 10.1016/j.diamond.2020.107996

  • Properties of titanium oxynitride films deposited on glass substrate by reactive high-power pulsed magnetron sputtering Reviewed International journal

    T. Kimura, T. Tanaka

    Japanese Journal of Applied Physics   59   SHHE03   2020.06

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:The Japan Society of Applied Physics  

    DOI: 10.7567/1347-4065/ab5e5b

  • Effects of adding hydrocarbon gas to a high-power impulse magnetron sputtering system on the properties of diamond-like carbon films Reviewed International journal

    T. Kimura, K. Sakai

    Thin solid films   701   137924   2020.05

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier  

    DOI: 10.1016/j.tsf.2020.137924

  • Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system Reviewed International journal

    Y. Shibata, T.Kimura, S. Nakao, K.Azuma

    Diamond & Related Materials   101   107635   2020.01

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    Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier  

    DOI: 10.1016/j.diamond.2019.107635

  • Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering

    T.Kimura, T. Tanaka

    XXXIV International COnference on Phenomena in ionzied gases   2019.07

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    Authorship:Lead author   Language:English   Publishing type:Research paper (international conference proceedings)  

  • Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system

    T. Kimura , Y. Shibata, S. Nakao and K. Azuma

    Proceedings International symposium on sputtering & plasma processes   178 - 180   2019.06

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    Authorship:Lead author   Language:English   Publishing type:Research paper (international conference proceedings)  

  • Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges Reviewed International journal

    Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao

    Vacuum   157   192 - 201   2018.11

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    Authorship:Lead author   Language:English   Publishing type:Research paper (scientific journal)   Publisher:Elsevier  

    DOI: 10.1016/j.vacuum.2018.08.043

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Books and Other Publications

  • New Developments of Plasma Surface Engineering

    ( Role: Contributor)

    2023.02 

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    Total pages:72   Responsible for pages:5   Language:jpn   Book type:Report

Presentations

  • Vanadium oxide films synthesized via reactive HiPIMS combined with multi pulse magnetron sputtering International conference

    Takashi Kimura and Yoshinobu Takagi

    44th International Symposium on Dry Process   2023.11  The JapanSociety of Applied Physics

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    Event date: 2023.11

    Language:English   Presentation type:Poster presentation  

    Venue:Winc Aichi   Country:Japan  

  • Hard diamond-like carbon thin film deposited by multi pulse HiPIMS

    Kenta Ozeki and Takashi Kimura

    2023.10 

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    Event date: 2023.10 - 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Fabrication of zirconium oxide films by reactive HiPIMS combined with multi pulse magnetron sputtering

    Shunsuke Ando and Takashi Kimura

    2023.10 

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    Event date: 2023.10 - 2023.11

    Language:Japanese   Presentation type:Oral presentation (general)  

    Country:Japan  

  • Synthesis of diamond-like carbon thin film via multi pulse high-power impulse magnetron sputtering International conference

    Takashi Kimura

    75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas  2022.10  American Physical Society/The Japan Society of Applied Physics

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    Event date: 2022.10

    Language:English   Presentation type:Poster presentation  

    Venue:Sendai International Center   Country:Japan  

    Other Link: https://meetings.aps.org/Meeting/GEC22/Session/HT4.71

  • Properties of vanadium oxide film prepared using pulsed magnetron sputtering

    Yoshinobu Takagi, Takashi Kimura

    75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas  2022.10  American Physical Society/The Japan Society of Applied Physics

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    Event date: 2022.10

    Language:English   Presentation type:Poster presentation  

    Venue:Sendai International Center   Country:Japan  

    Other Link: https://meetings.aps.org/Meeting/GEC22/Session/HW6.71

  • Properties of Titanium–Vanadium Nitride Films Prepared By Reactive High Power Pulsed Sputtering Penning Discharges International conference

    Takashi Kimura, Ryo Yoshida, Kingo Azuma

    The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)   International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee

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    Event date: 2019.12

    Language:English   Presentation type:Poster presentation  

    Venue:The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan  

  • Si content dependence of TiSiN films prepared by reactive high power pulsed sputtering Penning discharges International conference

    Takashi Kimura, Ryo Yoshida, Kingo Azuma

    The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)  International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee

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    Event date: 2019.12

    Language:English   Presentation type:Poster presentation  

    Venue:The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan  

  • Double Pulsing Method for Preparation of Hard DLC Films in High Power Pulsed Magnetron Sputtering System International conference

    Takashi Kimura and Kento Sakai

    12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  Asian Joint Committee for Applied Plasma Science and Engineering

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    Event date: 2019.09

    Language:English   Presentation type:Poster presentation  

    Venue:Maison Glad Hotel, Jeju Island, Korea  

  • Properties of TiSiN films Prepared by High Power Pulsed Sputtering Penning Discharge International conference

    Takashi Kimura, Ryo Yoshida and Kingo Azuma

    12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  Asian Joint Committee for Applied Plasma Science and Engineering

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    Event date: 2019.09

    Language:English   Presentation type:Poster presentation  

    Venue:Maison Glad Hotel, Jeju Island, Korea  

  • Influence of small amount of hydrocarbon gas mixture on properties of DLC films in high power impulse magnetron sputtering system International conference

    Takashi Kimura, Kento Sakai

    XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10)  第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会

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    Event date: 2019.07

    Language:English   Presentation type:Poster presentation  

    Venue:Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan  

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Committee Memberships

  • 日本表面真空学会 中部支部   役員  

    2021.04   

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    Committee type:Academic society

  • 電気学会 部門調査専門委員会   調査専門委員  

    2019.01 - 2021.12   

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    Committee type:Academic society

    プラズマ材料表面処理技術の動向に関する調査専門委員会

  • 電気学会   プラズマ技術委員会委員  

    2011.04 - 2014.03   

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    Committee type:Academic society

  • 電気学会   プラズマ技術委員会委員  

    2008.04 - 2011.03   

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    Committee type:Academic society

  • 応用物理学会   プラズマエレクトロニクス分科会幹事  

    1999.04 - 2001.03   

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    Committee type:Academic society