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Affiliation Department |
Department of Physical Science and Engineering
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Title |
Associate Professor |
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External Link |
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KIMURA Takashi
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Degree
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Doctor (Engineering) ( Nagoya Institute of Technology )
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Master of Engineering ( Nagoya Institute of Technology )
From School
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Nagoya Institute of Technology Faculty of Engineering Graduated
- 1987.03
Country：Japan
From Graduate School
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Nagoya Institute of Technology Graduate School, Division of Engineering Master's Course Completed
- 1989.03
Country：Japan
Professional Memberships
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The Instituteof Electrical Engineers of Japan
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The Japan Society of Applied Physics
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The Japan Society of Vacuum and Surface Science
Research Career
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Study on application of atmospheric pressure discharges
(not selected)
Project Year：
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Design of low pressure plasmas for materials processing
(not selected)
Project Year：
Papers
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Properties of CrN/TiN multilayer films with nanoscale layer thickness Reviewed International journal
Takashi Kimura, Hiroki Maeda
IEEE TRANSACTIONS ON PLASMA SCIENCE 51 ( 2 ) 327 - 332 2023.02
Authorship：Lead author, Corresponding author Language：English Publishing type：Research paper (scientific journal) Publisher：IEEE
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Properties of multilayered CrN/VN films prepared using a hybrid system of high-power impulse magnetron sputtering and pulsed magnetron sputtering Reviewed International journal
Takashi Kimura, Hiroki Maeda
IEEE TRANSACTIONS ON PLASMA SCIENCE 51 ( 2 ) 320 - 326 2023.02
Authorship：Lead author, Corresponding author Language：English Publishing type：Research paper (scientific journal) Publisher：IEEE
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Titanium silicon nitride films with low silicon content deposited via reactive high-power pulsed sputtering Penning discharge Reviewed International journal
T. Kimura, R. Yoshida, K. Azuma
IEEE TRANSACTIONS ON PLASMA SCIENCE 49 ( 1 ) 53 - 60 2021.01
Authorship：Lead author Language：English Publishing type：Research paper (scientific journal) Publisher：IEEE
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Synthesis of hard diamond-like carbon films by double-pulse high-power impulse magnetron sputtering Reviewed International journal
T. Kimura, K. Sakai
Diamond & Related Materials 108 107996 2020.08
Authorship：Lead author Language：English Publishing type：Research paper (scientific journal) Publisher：Elsevier
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Properties of titanium oxynitride films deposited on glass substrate by reactive high-power pulsed magnetron sputtering Reviewed International journal
T. Kimura, T. Tanaka
Japanese Journal of Applied Physics 59 SHHE03 2020.06
Authorship：Lead author Language：English Publishing type：Research paper (scientific journal) Publisher：The Japan Society of Applied Physics
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Effects of adding hydrocarbon gas to a high-power impulse magnetron sputtering system on the properties of diamond-like carbon films Reviewed International journal
T. Kimura, K. Sakai
Thin solid films 701 137924 2020.05
Authorship：Lead author Language：English Publishing type：Research paper (scientific journal) Publisher：Elsevier
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Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system Reviewed International journal
Y. Shibata, T.Kimura, S. Nakao, K.Azuma
Diamond & Related Materials 101 107635 2020.01
Language：English Publishing type：Research paper (scientific journal) Publisher：Elsevier
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Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering
T.Kimura, T. Tanaka
XXXIV International COnference on Phenomena in ionzied gases 2019.07
Authorship：Lead author Language：English Publishing type：Research paper (international conference proceedings)
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Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system
T. Kimura , Y. Shibata, S. Nakao and K. Azuma
Proceedings International symposium on sputtering & plasma processes 178 - 180 2019.06
Authorship：Lead author Language：English Publishing type：Research paper (international conference proceedings)
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Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges Reviewed International journal
Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao
Vacuum 157 192 - 201 2018.11
Authorship：Lead author Language：English Publishing type：Research paper (scientific journal) Publisher：Elsevier
Books and Other Publications
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New Developments of Plasma Surface Engineering
（ Role： Contributor）
2023.02
Total pages：72 Responsible for pages：5 Language：jpn Book type：Report
Presentations
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Vanadium oxide films synthesized via reactive HiPIMS combined with multi pulse magnetron sputtering International conference
Takashi Kimura and Yoshinobu Takagi
44th International Symposium on Dry Process 2023.11 The JapanSociety of Applied Physics
Event date： 2023.11
Language：English Presentation type：Poster presentation
Venue：Winc Aichi Country：Japan
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Hard diamond-like carbon thin film deposited by multi pulse HiPIMS
Kenta Ozeki and Takashi Kimura
2023.10
Event date： 2023.10 - 2023.11
Language：Japanese Presentation type：Oral presentation (general)
Country：Japan
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Fabrication of zirconium oxide films by reactive HiPIMS combined with multi pulse magnetron sputtering
Shunsuke Ando and Takashi Kimura
2023.10
Event date： 2023.10 - 2023.11
Language：Japanese Presentation type：Oral presentation (general)
Country：Japan
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Synthesis of diamond-like carbon thin film via multi pulse high-power impulse magnetron sputtering International conference
Takashi Kimura
75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas 2022.10 American Physical Society/The Japan Society of Applied Physics
Event date： 2022.10
Language：English Presentation type：Poster presentation
Venue：Sendai International Center Country：Japan
Other Link： https://meetings.aps.org/Meeting/GEC22/Session/HT4.71
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Properties of vanadium oxide film prepared using pulsed magnetron sputtering
Yoshinobu Takagi, Takashi Kimura
75th Annual Gaseous Electronics Conference/11th International Conference on Reactive Plasmas 2022.10 American Physical Society/The Japan Society of Applied Physics
Event date： 2022.10
Language：English Presentation type：Poster presentation
Venue：Sendai International Center Country：Japan
Other Link： https://meetings.aps.org/Meeting/GEC22/Session/HW6.71
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Si content dependence of TiSiN films prepared by reactive high power pulsed sputtering Penning discharges International conference
Takashi Kimura, Ryo Yoshida, Kingo Azuma
The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11) International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee
Event date： 2019.12
Language：English Presentation type：Poster presentation
Venue：The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan
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Properties of Titanium–Vanadium Nitride Films Prepared By Reactive High Power Pulsed Sputtering Penning Discharges International conference
Takashi Kimura, Ryo Yoshida, Kingo Azuma
The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11) International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee
Event date： 2019.12
Language：English Presentation type：Poster presentation
Venue：The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan
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Double Pulsing Method for Preparation of Hard DLC Films in High Power Pulsed Magnetron Sputtering System International conference
Takashi Kimura and Kento Sakai
12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) Asian Joint Committee for Applied Plasma Science and Engineering
Event date： 2019.09
Language：English Presentation type：Poster presentation
Venue：Maison Glad Hotel, Jeju Island, Korea
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Properties of TiSiN films Prepared by High Power Pulsed Sputtering Penning Discharge International conference
Takashi Kimura, Ryo Yoshida and Kingo Azuma
12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) Asian Joint Committee for Applied Plasma Science and Engineering
Event date： 2019.09
Language：English Presentation type：Poster presentation
Venue：Maison Glad Hotel, Jeju Island, Korea
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Influence of small amount of hydrocarbon gas mixture on properties of DLC films in high power impulse magnetron sputtering system International conference
Takashi Kimura, Kento Sakai
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10) 第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会
Event date： 2019.07
Language：English Presentation type：Poster presentation
Venue：Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan
Committee Memberships
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日本表面真空学会 中部支部 役員
2021.04
Committee type：Academic society
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電気学会 部門調査専門委員会 調査専門委員
2019.01 - 2021.12
Committee type：Academic society
プラズマ材料表面処理技術の動向に関する調査専門委員会
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電気学会 プラズマ技術委員会委員
2011.04 - 2014.03
Committee type：Academic society
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電気学会 プラズマ技術委員会委員
2008.04 - 2011.03
Committee type：Academic society
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応用物理学会 プラズマエレクトロニクス分科会幹事
1999.04 - 2001.03
Committee type：Academic society