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Affiliation Department etc. |
Department of Electrical and Mechanical Engineering
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Title |
Professor |
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Mail Address |
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ICHIMURA Masaya
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Academic Society Affiliations
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2010.09-Now
The Materials Research Society of Japan
Field of expertise (Grants-in-aid for Scientific Research classification)
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Electronic materials/Electric materials
Research Career
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Electrical Characterization of Semiconductors
Collaboration in Japan (not selected)
Project Year： -
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Electro- and photochemical Deposition of Semiconductors
Individual (not selected)
Project Year： -
Papers
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Semiconducting Cu-doped AlOx films fabricated by drop-photochemical deposition
M. Umemura, M. Ichimura
Mater. Res. Express 2019.03 [Refereed]
Research paper (scientific journal) Multiple Authorship
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On the Possibility of Valence Control of Aluminum Oxide for Electronics Applications
M. Ichimura
J. Electron. Mater. 6 ( 1 ) 583 - 588 2019.01 [Refereed]
Research paper (scientific journal) Single Author
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Fabrication of Pyrite FeS2 Films from Electrochemically Deposited FeOOH by Sulfur Annealing
S. Maki, N. Takeda, M. Ichimura
Int. J. Electrochem. Sci. 13 10829 - 10836 2018.10 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Fabrication of Copper Oxide Thin Films by Galvanostatic Deposition from Weakly Acidic Solutions
M. Keikhaei, M. Ichimura
Int. J. Electrochem. Sci. 13 9931 - 9941 2018.09 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Electrochemical deposition of Cu-doped p-type iron oxide thin films
S. Kobayashi, M. Ichimura
Semicond. Sci. Technol. 33 ( 9 ) 105006 2018.09 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Passivation of surface recombination at the Si-face of 4H-SiC by acidic solutions
Y. Ichikawa, M. Ichimura, T. Kimoto, M. Kato
ECS J. Solid St. Sci. Technol. 7 ( 8 ) Q127 - Q130 2018.08 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Fast electrochemical deposition of Ni(OH)2 precursor involving water electrolysis for fabrication of NiO thin films
M. Koyama, M. Ichimura
Semicond. Sci. Technol. 33 ( 5 ) 055011 2018.05 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Effects of Complexing Agents on Electrochemical Deposition of FeSxOy in ZnO/FeSxOy Heterostructures
A. Supee, M. Ichimura
Applied Physics A 123 722 2017.11 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Improved performance of 3C-SiC photocathodes by using a pn junction
N. Ichikawa, M. Ichimura, M. Kato
Int. J. Hydrogen Energy 42 22698 - 22703 2017.10 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Electrochemical deposition of transparent p-type semiconductor NiO
137 542 - 546 2017.09 [Refereed]
Research paper (scientific journal) Multiple Authorship
Review Papers
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Tips for vacuum measurement
85 ( 6 ) 508 2016.06 [Refereed] [Invited]
Introduction and explanation (scientific journal) Single Author
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Tips for Basic Vacuum Science and Technology
M. Ichimura
85 ( 1 ) 49 - 52 2016.01
Introduction and explanation (international conference proceedings) Single Author
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Introduction to Vacuum Science and Technology for Absolute Beginners
M. Ichimura
58 ( 8 ) 273 - 281 2015.08
Introduction and explanation (international conference proceedings) Single Author
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Thin film Si solar cells
29 - 36 2008.11
Introduction and explanation (others) Single Author
Presentations
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Impurity Doping in Aluminum Oxide for Electronics Applications
28th Annual Meeting of MRS-J 2018.12 - 2018.12 MRS-J
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Fabrication of MgO Thin Films by Electrochemical Deposition with Cu Catalyst
M. KEIKHAEI, M. ICHIMURA
第28回日本MRS年次大会 2018.12 - 2018.12
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Fabrication of FeOOH/FeS2 Heterojunctions by Electrochemical Deposition
27th annual meeting of MRS-J 2017.12 - 2017.12
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FABRICATION OF FeOOH/FeS2 HETERO JUNCTIONS by ELECTROCHEMICAL DEPOSITION AND SULFUR ANNEALING
S. Maki, M. Ichimura
27th Int. Photovoltaic Sci. Eng. Conf. (Otsu) 2017.11 - 2017.11
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CHARACTERIZATION OF FeS O THIN FILMS PREPARED BY THREE-STEP PULSE ELECTROCHEMICAL DEPOSITION
A. Supee, M. Ichimura
XXVI International Materials Research Congress (Mexico) 2017.08 - 2017.08
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ELECTROCHEMICAL DEPOSITION OF Cu-DOPED P-TYPE γ-FeOOH THIN FILMS
S. Kobayashi, M. Ichimura
XXVI International Materials Research Congress (Mexico) 2017.08 - 2017.08
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FABRICATION OF NiO THIN FILMS BY GALVANOSTATIC ELECTROCHEMICAL DEPOSITION
M. Koyama, M. Ichimura
XXVI International Materials Research Congress 2017.08 - 2017.08
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N TYPE AlOx THIN FILMS FABRICATED BY DROP PHOTOCHEMICAL DEPOSITION
M. Umemura, M. Ichimura
XXVI International Materials Research Congress (Mexico) 2017.08 - 2017.08
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Fabrication of Fe-S-O thin films by sulfur annealing of electrochemically deposited FeOOH films
S. Maki, M. Ichimura
26th Annual Meeting of MRS-J (Englich session) 2016.12 - 2016.12
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Fabrication of Fe-S/FeOOH hetero junctions by electrochemical deposition
N. Takeda, M. Ichimura
26th Annual Meeting of MRS-J (Englich session) 2016.12 - 2016.12
Industrial Property
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Method and apparatus for forming gold plating by photochemical deposition
特願 2004-210430 特開 2005-60828 特許 4521228
Method and apparatus for forming gold plating by photochemical deposition
Academic Awards Received
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SEMI Silicon Wafer Committee, Technical Committee Award 2006
2006.04
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Prof. Ramasamy National Award for Crystal Growth 2004
2004.04
Academic Activity
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2010.07-2010.12
The Materials Research Society of Japan