KIMURA Takashi

写真a

Affiliation Department etc.

Department of Physical Science and Engineering
Department of Physical Science and Engineering

Title

Associate Professor

Graduating School

  •  
    -
    1987.03

    Nagoya Institute of Technology   Faculty of Engineering   Graduated

Graduate School

  •  
    -
    1989.03

    Nagoya Institute of Technology  Graduate School, Division of Engineering  Master's Course  Completed

Degree

  • Nagoya Institute of Technology -  Doctor (Engineering)

  • Nagoya Institute of Technology -  Master of Engineering

Academic Society Affiliations

  •  
     
     

    The Society of Instrument and Control Engineers

  •  
     
     

    The Instituteof Electrical Engineers of Japan

  •  
     
     

    The Japan Society of Applied Physics

Field of expertise (Grants-in-aid for Scientific Research classification)

  • Plasma science

 

Research Career

  • Study on application of atmospheric pressure discharges

    (not selected)  

    Project Year:   - 

  • Design of low pressure plasmas for materials processing

    (not selected)  

    Project Year:   - 

Papers

  • Titanium silicon nitride films with low silicon content deposited via reactive high-power pulsed sputtering Penning discharge

    T. Kimura, R. Yoshida, K. Azuma

    IEEE TRANSACTIONS ON PLASMA SCIENCE ( IEEE )  49 ( 1 ) 53 - 60   2021.01  [Refereed]

    Research paper (scientific journal)   Multiple Authorship

  • Synthesis of hard diamond-like carbon films by double-pulse high-power impulse magnetron sputtering

    T. Kimura, K. Sakai

    Diamond & Related Materials ( Elsevier )  108   107996   2020.08  [Refereed]

    Research paper (scientific journal)   Multiple Authorship

  • Properties of titanium oxynitride films deposited on glass substrate by reactive high-power pulsed magnetron sputtering

    T. Kimura, T. Tanaka

    Japanese Journal of Applied Physics ( The Japan Society of Applied Physics )  59   SHHE03   2020.06  [Refereed]

    Research paper (scientific journal)   Multiple Authorship

  • Effects of adding hydrocarbon gas to a high-power impulse magnetron sputtering system on the properties of diamond-like carbon films

    T. Kimura, K. Sakai

    Thin solid films ( Elsevier )  701   137924   2020.05  [Refereed]

    Research paper (scientific journal)   Multiple Authorship

  • Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system

    Y. Shibata, T.Kimura, S. Nakao, K.Azuma

    Diamond & Related Materials ( Elsevier )  101   107635   2020.01  [Refereed]

    Research paper (scientific journal)   Multiple Authorship

  • Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering

    T.Kimura, T. Tanaka

    XXXIV International COnference on Phenomena in ionzied gases     2019.07

    Research paper (international conference proceedings)   Single Author

  • Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system

    T. Kimura , Y. Shibata, S. Nakao and K. Azuma

    Proceedings International symposium on sputtering & plasma processes     178 - 180   2019.06

    Research paper (international conference proceedings)   Multiple Authorship

  • Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges

    Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao

    Vacuum ( Elsevier )  157   192 - 201   2018.11  [Refereed]

    Research paper (scientific journal)   Multiple Authorship

  • Preparation of TiSiN films by high power pulsed sputtering Penning discharges

    R. Yoshida, T. Kimura

    2018 International Symposium on Dry Process     2018.11

    Research paper (international conference proceedings)   Multiple Authorship

  • Properties of TiON films prepared by reactive high power pulsed magnetron sputtering containing O2 and N2 gases

    T. Tanaka, T. Kimura

    2018 International Symposium on Dry Process     2018.11

    Research paper (international conference proceedings)   Multiple Authorship

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Presentations

  • Properties of Titanium–Vanadium Nitride Films Prepared By Reactive High Power Pulsed Sputtering Penning Discharges

    Takashi Kimura, Ryo Yoshida, Kingo Azuma

    The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)   (The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan)  2019.12  -  2019.12  International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee

  • Si content dependence of TiSiN films prepared by reactive high power pulsed sputtering Penning discharges

    Takashi Kimura, Ryo Yoshida, Kingo Azuma

    The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11)  (The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan)  2019.12  -  2019.12  International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee

  • Double Pulsing Method for Preparation of Hard DLC Films in High Power Pulsed Magnetron Sputtering System

    Takashi Kimura and Kento Sakai

    12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  (Maison Glad Hotel, Jeju Island, Korea )  2019.09  -  2019.09  Asian Joint Committee for Applied Plasma Science and Engineering

  • Properties of TiSiN films Prepared by High Power Pulsed Sputtering Penning Discharge

    Takashi Kimura, Ryo Yoshida and Kingo Azuma

    12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019)  (Maison Glad Hotel, Jeju Island, Korea)  2019.09  -  2019.09  Asian Joint Committee for Applied Plasma Science and Engineering

  • Influence of small amount of hydrocarbon gas mixture on properties of DLC films in high power impulse magnetron sputtering system

    Takashi Kimura, Kento Sakai

    XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10)  (Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan)  2019.07  -  2019.07  第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会

  • Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering

    Takashi Kimura, Takahiro Tanaka

    XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10)  (Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan)  2019.07  -  2019.07  第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会

  • Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system

    Takashi Kimura, Yuki Shibata,Setsuo Nakao and Kingo Azuma

    ISSP2019: The 15th International Symposium on Sputtering and Plasma Processes  (金沢工業大学)  2019.06  -  2019.06  The Japan Society of Vacuum and Surface Science

  • Preparation of TiN films by reactive high power pulsed sputter Penning-type discharges

    T. Mishima, T. Kimura, R. Yoshida, K. Azuma, S. Nakao

    39th Internatioal Symposium on Dry Process  (Tokyo Institute of Technology)  2017.11  -  2017.11  The Japan Society of Applied Physics

  • Plasma Based Nitrogen Ion Implantation to Hydrogenated Diamond-like Carbon Films

    T. Kimura, H.Yanai, S. Nakao, and K. Azuma

    11th Asian-European International Conference on Plasma Surface Engineering  (Jeju, Republic of Korea)  2017.09  -  2017.09  Asian Joint Committee for Applied Plasma Science and Engineering

  • ホロ-形状ターゲットを持つ高電力パルススパッタの電気特性

    木村高志,三島俊彦

    第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム  (北海道大学)  2017.01  -  2017.01  応用物理学会

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Academic Activity

  • 1999.04
    -
    2001.03

    The Japan Society of Applied Physics