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Affiliation Department etc. |
Department of Physical Science and Engineering
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Title |
Associate Professor |
KIMURA Takashi
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Graduating School
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-1987.03
Nagoya Institute of Technology Faculty of Engineering Graduated
Graduate School
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-1989.03
Nagoya Institute of Technology Graduate School, Division of Engineering Master's Course Completed
Degree
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Nagoya Institute of Technology - Doctor (Engineering)
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Nagoya Institute of Technology - Master of Engineering
Academic Society Affiliations
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The Society of Instrument and Control Engineers
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The Instituteof Electrical Engineers of Japan
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The Japan Society of Applied Physics
Field of expertise (Grants-in-aid for Scientific Research classification)
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Plasma science
Research Career
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Design of low pressure plasmas for materials processing
(not selected)
Project Year： -
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Study on application of atmospheric pressure discharges
(not selected)
Project Year： -
Papers
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Titanium silicon nitride films with low silicon content deposited via reactive high-power pulsed sputtering Penning discharge
T. Kimura, R. Yoshida, K. Azuma
IEEE TRANSACTIONS ON PLASMA SCIENCE ( IEEE ) 49 ( 1 ) 53 - 60 2021.01 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Synthesis of hard diamond-like carbon films by double-pulse high-power impulse magnetron sputtering
T. Kimura, K. Sakai
Diamond & Related Materials ( Elsevier ) 108 107996 2020.08 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Properties of titanium oxynitride films deposited on glass substrate by reactive high-power pulsed magnetron sputtering
T. Kimura, T. Tanaka
Japanese Journal of Applied Physics ( The Japan Society of Applied Physics ) 59 SHHE03 2020.06 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Effects of adding hydrocarbon gas to a high-power impulse magnetron sputtering system on the properties of diamond-like carbon films
T. Kimura, K. Sakai
Thin solid films ( Elsevier ) 701 137924 2020.05 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Preparation of silicon-doped diamond-like carbon films with electrical conductivity by reactive high-power impulse magnetron sputtering combined with a plasma-based ion implantation system
Y. Shibata, T.Kimura, S. Nakao, K.Azuma
Diamond & Related Materials ( Elsevier ) 101 107635 2020.01 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering
T.Kimura, T. Tanaka
XXXIV International COnference on Phenomena in ionzied gases 2019.07
Research paper (international conference proceedings) Single Author
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Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system
T. Kimura , Y. Shibata, S. Nakao and K. Azuma
Proceedings International symposium on sputtering & plasma processes 178 - 180 2019.06
Research paper (international conference proceedings) Multiple Authorship
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Preparation of titanium carbon nitride films by reactive high power pulsed sputtering Penning discharges
Takashi Kimura, Ryo Yoshida, Kingo Azuma, Setsuo Nakao
Vacuum ( Elsevier ) 157 192 - 201 2018.11 [Refereed]
Research paper (scientific journal) Multiple Authorship
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Preparation of TiSiN films by high power pulsed sputtering Penning discharges
R. Yoshida, T. Kimura
2018 International Symposium on Dry Process 2018.11
Research paper (international conference proceedings) Multiple Authorship
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Properties of TiON films prepared by reactive high power pulsed magnetron sputtering containing O2 and N2 gases
T. Tanaka, T. Kimura
2018 International Symposium on Dry Process 2018.11
Research paper (international conference proceedings) Multiple Authorship
Presentations
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Si content dependence of TiSiN films prepared by reactive high power pulsed sputtering Penning discharges
Takashi Kimura, Ryo Yoshida, Kingo Azuma
The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11) (The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan) 2019.12 - 2019.12 International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee
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Properties of Titanium–Vanadium Nitride Films Prepared By Reactive High Power Pulsed Sputtering Penning Discharges
Takashi Kimura, Ryo Yoshida, Kingo Azuma
The 11th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-11) (The Kanazawa Chamber of Commerce & Industry, Kanazawa , Japan) 2019.12 - 2019.12 International Organizing Committee of APSPST, IEEJ Electric Discharge, Plasma and Pulse Power Committee
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Double Pulsing Method for Preparation of Hard DLC Films in High Power Pulsed Magnetron Sputtering System
Takashi Kimura and Kento Sakai
12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) (Maison Glad Hotel, Jeju Island, Korea ) 2019.09 - 2019.09 Asian Joint Committee for Applied Plasma Science and Engineering
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Properties of TiSiN films Prepared by High Power Pulsed Sputtering Penning Discharge
Takashi Kimura, Ryo Yoshida and Kingo Azuma
12th Asian-European International Conference on Plasma Surface Engineering (AEPSE2019) (Maison Glad Hotel, Jeju Island, Korea) 2019.09 - 2019.09 Asian Joint Committee for Applied Plasma Science and Engineering
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Properties of titanium oxynitride films prepared by reactive high power pulsed magnetron sputtering
Takashi Kimura, Takahiro Tanaka
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10) (Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan) 2019.07 - 2019.07 第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会
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Influence of small amount of hydrocarbon gas mixture on properties of DLC films in high power impulse magnetron sputtering system
Takashi Kimura, Kento Sakai
XXXIV International Conference on Phenomena in Ionized Gases (XXXIV ICPIG) and the 10th International Conference on Reactive Plasmas (ICRP-10) (Sapporo Education and Culture Hall, Sapporo, Hokkaido, Japan) 2019.07 - 2019.07 第34回電離気体現象国際会議(XXXIV ICPIG)/第10回反応性プラズマ国際会議(ICRP-10) 実行委員会
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Deposition of Si-doped DLC films by reactive HiPIMS combined with PBII system
Takashi Kimura, Yuki Shibata,Setsuo Nakao and Kingo Azuma
ISSP2019: The 15th International Symposium on Sputtering and Plasma Processes (金沢工業大学) 2019.06 - 2019.06 The Japan Society of Vacuum and Surface Science
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Preparation of TiN films by reactive high power pulsed sputter Penning-type discharges
T. Mishima, T. Kimura, R. Yoshida, K. Azuma, S. Nakao
39th Internatioal Symposium on Dry Process (Tokyo Institute of Technology) 2017.11 - 2017.11 The Japan Society of Applied Physics
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Plasma Based Nitrogen Ion Implantation to Hydrogenated Diamond-like Carbon Films
T. Kimura, H.Yanai, S. Nakao, and K. Azuma
11th Asian-European International Conference on Plasma Surface Engineering (Jeju, Republic of Korea) 2017.09 - 2017.09 Asian Joint Committee for Applied Plasma Science and Engineering
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ホロ－形状ターゲットを持つ高電力パルススパッタの電気特性
木村高志，三島俊彦
第34回プラズマプロセシング研究会/第29回プラズマ材料科学シンポジウム (北海道大学) 2017.01 - 2017.01 応用物理学会